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XJPX
6387
Market cap585mUSD
Jul 10, Last price  
12,980.00JPY
1D
9.72%
1Q
40.78%
Jan 2017
1,143.30%
IPO
388.28%
Name

Samco Inc

Chart & Performance

D1W1MN
XJPX:6387 chart
P/E
61.43
P/S
11.16
EPS
211.31
Div Yield, %
0.51%
Shrs. gr., 5y
Rev. gr., 5y
9.74%
Revenues
9.34b
+13.89%
3,079,000,0004,251,000,0005,271,000,0004,039,000,0004,277,810,0005,253,315,0003,828,953,0004,201,393,0004,233,049,0005,252,909,0005,345,193,0003,124,652,0005,466,483,0004,936,132,0005,869,982,0005,746,666,0006,401,870,0007,830,591,0008,203,159,0009,342,282,000
Net income
1.70b
+15.31%
98,000,000347,000,000494,000,000304,000,000247,626,000430,175,000171,502,000354,503,000190,326,000417,263,000348,678,000-265,303,999407,919,000215,617,000634,740,000755,822,0001,052,910,0001,366,127,0001,471,991,0001,697,328,000
CFO
1.21b
-26.57%
6,000,000579,000,000439,714,000568,032,000418,571,000224,101,000461,492,00064,254,999-185,239,000167,621,0001,179,618,000295,647,000-223,892,000857,760,000868,007,000493,478,0001,181,167,000-189,395,0001,642,346,0001,206,003,000
Dividend
Jul 30, 202660 JPY/sh

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Profile

SAMCO Inc. manufactures and sales semiconductor and materials in Japan and internationally. The company primarily offers thin film deposition, microfabrication, cleaning, and surface treatment products. Its deposition systems include atomic layer deposition systems, Plasma enhanced chemical vapor deposition (PECVD) systems, liquid source CVD systems, and diamond-like carbon coating systems; and etching systems comprise inductively coupled plasma (ICP), silicon deep reactive ion, reactive ion, and xenon difluoride etching systems. It also provides Aqua Plasma cleaner, a plasma processing equipment; plasma cleaners; and UV ozone cleaners. The company was formerly known as SAMCO International, Inc. and changed its name to SAMCO Inc. in December 2004. SAMCO Inc. was incorporated in 1979 and is headquartered in Kyoto, Japan.
IPO date
May 30, 2001
Employees
173
Domiciled in
JP
Incorporated in
JP

Valuation

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